The requirements for contact hole patterning in the manufacturing of semiconductor quantum devices are very stringent, especially when it is needed to contact an array of high density of electrodes. We offer the possibility to deliver test structures designed specifically to test new advances in contact patterning for qubit manufacturing, primarily aimed at process equipment companies. The pilot line for fabrication of semiconductor quantum devices can deliver test structures designed on purpose to characterize litho, etching and metallization processes. Characterization facilities at the pilot line can be used to benchmark the results.